Since the early 2000s, our team has partnered with a semiconductor manufacturer to support the ongoing evolution of their research and development operations. Most recently, our team designed a new Central Utility Plant (CUP) and led the expansion of Building 51X (B51X), delivering critical infrastructure to support advanced wafer fabrication.
The 58,000-square-foot (5,388-square-metre) CUP delivers essential infrastructure to support the B51X research and development wafer fabrication facility. Designed as a multifunctional hub, the facility introduces enhanced chilled and hot water systems, compressed dry air (CDA), waste treatment, and ultra-pure water (UPW) services.
A dedicated facilities trestle links the CUP to B51X, designed to accommodate pyrophoric gas lines alongside essential building services. This enclosed and heated environmental chase maintains optimal 65-degree Fahrenheit operating conditions, while its modular structure affords seamless scalability for future fabrication expansion.
The expansion also included a fit-out of unfinished space within Building 51X, transforming it into a 54,000-square-foot (5,017-square-metre) ISO Class 5 turbulent flow cleanroom ballroom. An integrated catwalk system optimizes interstitial space and supports efficient coordination with automated material handling systems (AMHS). Coupled with upgraded air and electrical systems.
Together, these investments strengthen the site’s utility capacity, flexibility, and long-term readiness for future growth.
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